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Toshiyuki Urano,*a}b} Eiko Ohno-Okumura~~, Keiichi Sakamotod~, Shota Suzuki`~ and Tsuguo Yamaoka°} a)Research Center, Mitsubishi Kagaku Corporation, Aoba, Yokohama 227 Japan b) Center for Cooperative research, Chiba University, Inage, Chiba 263-8522, Japan c) Research Institute of Chemical Science, Technology and Education, 8-37104 Narashinodai, Funabashi, Chiba 274-0063 Japan d) Department of Industrial Chemistry, College of Industrial Technology, Nihon University, 1-2-1 Izumio, Narashino, Chiba 275-8575 Japan e) Department of Information and Image Science, Faculty of Engineering, Chiba University, Inage-ku, Chiba 263-8522, Japan. The sensitization mechanisms for photoinitiations comprising a 2,8-diethyl-1,3 ,5,7,9pentamethylbipyrromethene difluoroborate (EBP) and a 1,3,5,7,9-pentamethylbipyrromethene difluoroborate (HBP), and a radical generating reagent, 3,3',4,4'-tetrakis(tbutylperoxycarbonyl)benzophenone (BTTB) in a poly(methyl methacrylate) (PMMA) film have been investigated by laser flash photolysis using a total reflection cell and cyclic voltammetry. Effect in sensitization mechanisms with incorporating ethyl group into bipyrromethene dye was discussed. Keyword: photopolymerization, sensitizer, laser, pyrromethene

Effect of Ethyl group in Sensitization Mechanisms of Pyrromethene Dyes in Photopolymer Coating Layer.