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Discrimination enhancement of poly-hydroxystyrene based chemically amplified positive resists was investigated with acid and base neutralization model in Eq. 8. Relationship of deprotecting reactivity and discrimination property was reported in Fig. 7. Dissolution distribution in resist film depth was discussed to be important characteristic to fabricate fine sub-quarter micron pattern in Fig. 9.

Investigation of Discrimination Enhancement with New Modeling for Poly-Hydroxystyrene Positive Resists.