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We have proposed a new concept of acid proliferation reactions which involves the acid-catalyzed decomposition of an organic compound to release another strong acid, leading to the autocatalytic decomposition. On the bases of this concept, we have so far studied on photoresist materials using these acid amplifiers for UV light sensitive systems to improve this photosensitivity.[1-5] Chemically amplified photoresists for visible laser direct imaging were reported.[6,7] This material consists of a photoacid generator, a sensitizer dye and an acidlabile polymer. In this system, the formation of acid from a photoacid generator sensitized by a dye results in the acid-catalyzed deprotection of acid-labile polymer, providing positive-working photoresists. In this work, we adopt this system and aimed at the development a novel visible-light-sensitive photopolymer using acid amplifiers to improve the photosensitivity ( Fig. 1 ). A film of poly(tert-butyl methacrylate) (PTBMA) containing 10 wt% of diphenyliodonium triflate (DPITf) as a photoacid generator, 2 wt% of 9, l0-bis(phenylethynyl)anthracene (BPEA) or 1,8-dimethoxy-9,10-bis(phenylethynyl)anthracene as a sensitizer dye and 10-20 wt% of cis-3-(ptoluenesulfonyloxy)-2-pinanol (1) as an acid amplifier was made by spin-coating onto a silicon wafer and baking at 110 `C on a

Visible-Light-Sensitive Photopolymer Systems Using Diol Monosulfonate as Acid Amplifiers.