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A nanoscale investigation of three-dimensional (3-D) surface micromorphology of archetypical N, N0- bis (n-etyl) x:y, dicyanoperylene- 3, 4:9, 10 bis (dicarboximide) (PDI8-CN 2 ) thin films on H-Si substrates, which are applicable in n-type semiconducting compounds, has been performed by using fractal analysis. In addition, surface texture characteristics of the PDI8-CN 2  thin films have been characterized by using atomic force microscopy (AFM) operated in tapping-mode in the air. These analyses revealed that all samples can be described well as fractal structures at nanometer scale and their three dimensional surface texture could be implemented in both graphical models and computer simulations.

Surface micromorphology characterization of PDI8-CN2 thin films on H-Si by AFM analysis

Surface micromorphology characterization of PDI8-CN₂ thin films on H-Si by AFM analysis