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Mask-Coating Using Inorganic Agent for Chemical Vapor Deposition Treatment by Chuji KAGAYA*, Masanori KATO*, Noboru EGAMI** and Masaru IKENAGA*** Chemical vapor deposition (CVD) method is used to deposit hard wear resistant materials such as titanium carbide and nitride onto a substrate. A suitable masking agent for CVD has not yet been developed at present, however. The purpose of this paper was to investigate the possible utilization of inorganic agents for such mask-coating. Both of the portion pre-coated with an inorganic agent and the un-precoated portion have been examined by means of X-ray diffraction analysis, hardness tests and structure observations. The characteristics of the inorganic mask-coating agent were also investigated by differential thermal analysis and gas chromatography. The experimental results showed that masking was successful with this agent. This coating was thermally as well as chemically stable and can be used as a masking agent for the CVD treatment. キー ・ワー ド:無 機 質 コー テ ィ ン グ剤,CVDマ ス キ ン グ剤,示 差 熱 曲 線,分 解 ガス

Mask-coating using inorganic agent for chemical vapor deposition treatment.