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We have investigated the structural and magnetic properties for Co2(Cr1 xFex)Al (x ¼ 0:4, 0.6 and 1.0) full-Heusler alloy films deposited on MgO(001), MgO(011) and sapphire (a-plane) substrates by magnetron sputtering. Substrate temperatures were varied from ambient temperature to 773 K. The XRD patterns reveal that the Co2(Cr1 xFex)Al films grow epitaxially with the (001), (112), and (011) orientations on MgO(001), MgO(110) and sapphire (a-plane) substrates, respectively. The Co2(Cr1 xFex)Al films deposited at room temperature (RT) crystallize into the A2 structure, whereas the films deposited at 673 K showed the B2 structure. Especially, for the Co2FeAl (x ¼ 1) films deposited on an MgO(001) substrate at 773 K, the crystal structure is determined to be the L21 structure with a flat surface. The saturation magnetization of Co2FeAl films with the B2 and L21 structures exhibits almost the 5  B/f.u., whereas those of Co2(Cr1 xFex)Al (x ¼ 0:4, 0.6) show a reduction from the theoretical values. This reduction of the saturation magnetization might be due to the anti-ferromagnetic coupling between Cr–Cr atoms.

materials transactions

Epitaxial Growth of Ordered Co&lt;SUB&gt;2&lt;/SUB&gt;(Cr&lt;SUB&gt;1&amp;minus;&lt;I&gt;x&lt;/I&gt;&lt;/SUB&gt;Fe&lt;I&gt;&lt;SUB&gt;x&lt;/SUB&gt;&lt;/I&gt;)Al Full-Heusler Alloy Films on Single Crystal Substrates