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Nickel oxide (NiO) films with NaCl-type structure were deposited onto Corning glass substrates at different substrate temperatures by radio-frequency (RF) magnetron sputtering under an RF power of 200 W. The resulting films were analyzed by grazing-incidence X-ray diffraction, ultrahigh resolution scanning electron microscopy (HR-SEM) and high-resolution transmission electron microscopy (HR-TEM). The relationships among the gas ratio of O2, substrate temperature, preferred orientation and microstructure of the NiO films were investigated. Those films deposited at a substrate temperatures of 303 or 473 K with the ratio of oxygen varying from 0 to 100% displayed a (111) preferred orientation. At the substrate temperature of 673 K, while the (111)-orientated film was obtained under a low ratio of oxygen (< 50 %O 2), a (200) preferred orientation was developed under 100% oxygen. All the films have a columnar structure with the growth direction perpendicular to the surface. The origin of the preferred orientations is also discussed.

Effects of Substrate Temperature and Oxygen Pressure on Crystallographic Orientations of Sputtered Nickel Oxide Films