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The Pd and Pd–Ni thin films with an fcc structure were prepared by sputtering. The films were immersed in the pure water and the hydrogen-dissolved water alternatively and the electrical resistance of the films was measured during the immersion. The Pd and Pd–Ni thin films possess good sensitivity to hydrogen dissolved in water. The electrical resistance of the films increases in the hydrogen-dissolved water and decreases in the pure water with excellent reproducibility. The electrical resistance change of the Pd–Ni alloy films is smaller than that of the Pd films. Nickel addition improves the response of increase/decrease of the electrical resistance during the immersion in the pure water and the hydrogen-dissolved water. The detailed electrical behavior of the films is investigated in this study.

Electrical Resistance Change due to Hydrogenation of Pd and Pd&ndash;Ni Thin Films Immersed in Hydrogen-Dissolved Water

Electrical Resistance Change due to Hydrogenation of Pd and Pd–Ni Thin Films Immersed in Hydrogen-Dissolved Water