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Photocatalytic titanium oxide (TiO 2 ) thin films were prepared on quartz substrate by the pulsed laser deposition using Nd:YAG (λ = 1.064 μm) pulse laser. Subsequently, the films were sulfurized in H 2 S or CS 2 atmosphere under various conditions. After the sulfurization of the film in H 2 S or CS 2 at 1273 K for I h, the surface morphology and structure of the deposited TiO 2 film were changed. The photocatalytic property of the film might be improved by the sulfurization using CS 2 at the temperatures lower than 1273 K.

Partial Sulfurization of Laser-ablated Titanium Oxide Film for the Improvement in Photocatalytic Property