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In this work, the effect of the electrodes separation on plasma parameters and morphology properties for coated glass samples by silver metal using low voltage DC discharge plasma sputtering source. At fixed argon gas pressure 0.2 mbar and discharge currents Id(20,30,40,50 and 60)mA, for different electrodes separation d (3,4,4.5,5,6)cm was studied. The plasma sputtering source consists of a cylindrical chamber including two circular electrodes made from stainless steel. The cathode electrode is carrying the silver metal as a target and permanent magnet, while a glass sample coater is placed on the anode electrode. The plasma parameters: temperature of electron(Te) and ion density(ni) were determined by using cylindrical single Langmuir probe. Also, the surface morphology for the coater samples were studied by atomic force microscope (AFM). The results of this work shown that a linear increases in ions density and an exponential decreasing in electron temperature for different electrodes separation. Furthermore, the relationship between the average grain diameter and average grain height as a function of electrodes separation are nonlinear. The minimum average grain diameter is (90 nm) at d=4 cm for Id=40 mA and minimum average grain height is (5.5 nm) at the same electrodes separation and discharge current. When the temperature of electron increased, the values of average grain diameter increased while the values of average grain height decreased. Keyword: Langmuir probe, surface morphology, magnetron sputtering, DC discharge. 1Introduction Cold plasma technologies have found a widely field used in different applications such as, in material processing, manufacture of thin film material, medicine and industrial process [1-5]. The magnetic field is widely used which caused enhancement of some attractive features for discharge in plasma source [6,7]. Sputtering process is one of the most common ways to fabricate thin films, nanostractured, coating and nanoparticle of various materials [8,9]. The basic process for production particles as follows: A target (cathode) of material desired to be deposited, is bombarded with energetic ions. Then, the target atoms are ejected into the space and travel some distance until they reach the substrate and formed a thin layer. In magnetron sputtering a higher plasma density and deposition rates can be achieved by using a magnetic field which confines the motion of secondary electrons near the cathode surface (target). Furthermore, an applied of magnetic field is caused for enhancing the efficiency and quality of deposited films at lower inert gas pressure [10,11,12]. Generally, a DC power supply is usually used to sputter conducting target, while RF power supply is required for insulator or semiconductor target [13,14]. In the present work, different electrodes separations for planar DC magnetron plasma coater low voltages were investigated to determine the effects of this variation on the electrical characteristics discharge, plasma diagnostics and the morphology of silver coater on glass substrate by using a constant argon inert gas pressure. 2Experimental setup Fig.(1) shows a schematic diagram of the experimental setup. The cylindrical discharge chamber is a Borosilicate glass tube of 127 mm length and 165 mm diameter. Two parallel, circular electrodes made of stainless steel are enclosed in the discharge chamber. The anode (stage of substrate) is made of stainless steel with a diameter 50 mm and the cathode of silver with a diameter 57 mm and 0.1 mm thick as a target according to the

Effect of Electrodes Separation in DC Plasma Sputtering on Morphology of Silver Coated Samples