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This paper determines the relation between the geometry of metric space of TiAlNiAu thin film metal system surface and the geometry of functional space of its sheet resistances Rsq . The investigation provides a means to describe a lateral size effect observed in local approximation that involves a dependency of sheet resistance Rsq of TiAlNiAu metal film on its lateral linear dimensions (in (x, y) plane). This dependency is defined by fractal geometry of dendrites, or, more specifically, it is a power-law dependency of linear dimension variation on fractal dimension D f . The revealed relation has a great practical importance both for a precise calculation of thin film metal system Rsq values in designing discreet devices and ICs, and for controlling results at microand nanoscale in producing workflow for thin metal films and systems based on them. Физика и техника полупроводников, 2019, том 53, вып. 1

Слоевое сопротивление TiAlNiAu тонкопленочной металлизации омических контактов к нитридным полупроводниковым структурам