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Reported here is the use of the focused beam of an infrared ultrashort pulse laser (150 femtoseconds pulse width, 200 kHz repetition rate, 800 nm wavelength, and 100 μm/s scanning speed) to increase the refractive index of a germanium-doped silica-glass planar waveguide. The increase obtained, Δn, itself increases in proportion to increases in the laser intensity of the surface irradiation, and it saturates to 1.6 ∼ 1.8 × 10-3 at 2.2 TW/cm2, without producing any increase in insertion loss and birefringence. Further, no decay in the refractive index change is observed after annealing at 200 °C for 10 hours. Results show that ultrashort pulse lasers are more suitable than UV lasers as light sources for highly stable adjustment of the optical lengths of waveguide devices.

Increasing the Refractive Index of a Germanosilicate Planar Waveguide by Irradiation with an Infrared Ultrashort Pulse Laser.