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Infrared diode laser absorption spectroscopy (IRLAS) was used to measure the CH3 (methyl) radical density in an RF-discharge methane plasma. It was found that the CH3 radical density was of the order of 1012 cm-3. We also measured the CH3 radical density as a function of Xe or Ar gas partial pressure, and this partial pressure dependence shows that the addition of Xe brings about an increase in the CH3 radical density.

Measurement of CH3 Radical in RF Methane/Rare Gas Plasma Using Infrared Diode Laser Absorption Spectroscopy.