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New disposal limits have been computed for Vault 4 of the Saltstone Disposal Facility based on several revisions to the models in the existing Performance Assessment and the Special Analysis issued in 2002. The most important changes are the use of a more rigorous groundwater flow and transport model, and consideration of radon emanation. Other revisions include refinement of the aquifer mesh to more accurately model the footprint of the vault, a new plutonium chemistry model accounting for the different transport properties of oxidation states III/IV and V/VI, use of variable infiltration rates to simulate degradation of the closure system, explicit calculation of gaseous releases and consideration of the effects of settlement and seismic activity on the vault structure. The disposal limits have been compared with the projected total inventory expected to be disposed in Vault 4. The resulting sum-of-fractions of the 1000-year disposal limits is 0.2, which indicates that the performance objectives and requirements of DOE 435.1 will not be exceeded. This SA has not altered the conceptual model (i.e., migration of radionuclides from the Saltstone waste form and Vault 4 to the environment via the processes of diffusion and advection) of the Saltstone PA (MMES 1992) nor has it altered the conclusions of the PA (i.e., disposal of the proposed waste in the SDF will meet DOE performance measures). Thus a PA revision is not required and this SA serves to update the disposal limits for Vault 4. In addition, projected doses have been calculated for comparison with the performance objectives laid out in 10 CFR 61. These doses are 0.05 mrem/year to a member of the public and 21.5 mrem/year to an inadvertent intruder in the resident scenario over a 10,000-year time-frame, which demonstrates that the 10 CFR 61 performance objectives will not be exceeded. This SA supplements the Saltstone PA and supersedes the two previous SAs (Cook et al. 2002; Cook and Kaplan 2003)

Special Analysis: Revision of Saltstone Vault 4 Disposal Limits (U)