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One of the main Phase I objectives of this subcontract was for EPV to demonstrate 14%-efficient CIGS devices using a hybrid process. The processing was also required to have good control ability. These goals were successfully accomplished. It will be seen that during Phase I, we successfully developed a new, simplified hybrid process. A highlight of intensive work was the achievement of a 14.0% NREL-verified device at a CIGS thickness of 1.13 ..mu..m. The simplified hybrid process considerably reduces CIGS film formation time and offers the promise of being a truly cost-effective and manufacturable one. It is considered to be one of the more attractive CIGS processes in the industry

Uniform, High Efficiency, Hybrid CIGS Process with Application to Novel Device Structures: Annual Technical Report, 15 March 2005 - 14 March 2006