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This quarterly report provides a status update for each of the milestones for the International Sematech project on the development of high-NA optics for a small-field EUVL exposure tool. The optical design has been completed, which employs two aspheric mirrors yielding diffraction-limited imaging within a 600 {micro}m x 200 {micro}m field with a numerical aperture of 0.3 and a 5x reduction. Preliminary aerial image calculations show good resolution of 30nm features with partially coherent illumination. Contracts have been awarded for the fabrication and multilayer coating of the mirror elements and a detailed specification package has been generated for one of the mirror substrates (M1). Metrology instrumentation is being assembled and fabrication has been initiated on M1. Key progress includes the design and fabrication of kinematic mounting fixtures that enable the vendor to perform interferometry in a geometry compatible with PO Box fixturing. The first substrate is proceeding according to schedule, with delivery expected in December 1999

Quarterly Report for High NA Optics Development: Q3-1999 International Sematech Project LITH 112