English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Zendy Plus

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Zendy Tools

Zendy Open

The main goals of this paper are: (1) To develop a low-pressure CVD (LPCVD) process that allows epitaxial growth at lower temperatures. Lower temperatures will allow the achievement of a sharp dopant profile at the substrate/epi-layer interface. Less out-diffusion from the substrate would allow the use of thinner epitaxial layers, which would lead to a larger depletion width in the photoactive region. LPCVD also avoids, to a great extent, gas-phase nucleation, which would cause Ge particulates to fall onto the wafer surface during growth. (2) To reduce high levels of oxygen and copper present at the wafer interface, as observed by secondary ion mass spectroscopy (SIMS). In order to achieve high-quality epitaxial layers, it is imperative that the substrate surface be of excellent quality. (3) To make and test detectors, after satisfactory epitaxial layers have been made.

Development of ultra pure germanium epi layers for blocked impurity band far infrared detectors