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Planar waveguides created by the implantation at 500 C of 2.5 x 10{sup 17} Ti ions/cm{sup 2} and 2.5, 5.0 and 7.5 x 10{sup 17} O ions/cm{sup 2} have been characterized for loss by the scattered light and cutback techniques. Results indicate losses of less than 2.5 dB/cm to 3 dB/cm for waveguides with a Ti:O ratio of 1:3 and losses of over 7 dB/cm{sup 2} for waveguides with Ti:O ratios of 1:1 and 1:2

Loss measurements and stoichiometric dependence of Ti and O implanted LiNbO{sub 3} waveguides