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Aim of this laboratory-directed research and development (LDRD) project was to develop diamond and/or diamond-like carbon (DLC) films for electronic applications. Quality of diamond and DLC films grown by chemical vapor deposition (CVD) is not adequate for electronic applications. Nucleation of diamond grains during growth typically results in coarse films that must be very thick in order to be physically continuous. DLC films grown by CVD are heavily hydrogenated and are stable to temperatures {le} 400{degrees}C. However, diamond and DLC`s exceptional electronic properties make them candidates for integration into a variety of microelectronic structures. This work studied new techniques for the growth of both materials. Template layers have been developed for the growth of CVD diamond films resulting in a significantly higher nucleation density on unscratched or unprepared Si surfaces. Hydrogen-free DLC with temperature stability {le} 800{degrees}C has been developed using energetic growth methods such as high-energy pulsed-laser deposition. Applications with the largest system impact include electron-emitting materials for flat-panel displays, dielectrics for interconnects, diffusion barriers, encapsulants, and nonvolatile memories, and tribological coatings that reduce wear and friction in integrated micro-electro-mechanical devices

Diamond and diamond-like carbon films for advanced electronic applications