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Materials Research Group (MRG), Inc., is developing in-situ sensors to improve yield, reproducibility, average efficiency, and prevention of ''lost processes.'' In-situ X-ray fluorescence (XRF) will be used to monitor composition and thickness of deposited layers, and in-situ optical emission spectroscopy (OES) will be used to provide real-time feedback describing the deposition plasma. Characterization techniques are to be examined ex-situ in the first two years of the contract, and applied to existing deposition systems in the final year. Progress toward achieving these goals during Phase I includes: Development and verification of an XRF simulation tool to troubleshoot measurements, to predict difficulties in XRF interpretation, and to calculate quantities needed in the translation from XRF signal to composition; Examination of the implication of sample conditions unique to CIGS photovoltaics - such as varying Ga gradients, intermediate film thicknesses where neither thick-film nor thin-film approximations are valid, variations in back-contact thickness, multiple layers, variations in substrate composition and thickness - on XRF interpretation; Fabrication of CIGS samples and test structures for XRF measurements; Execution and interpretation of XRF measurements examining system accuracy; Design of a prototype XRF sensor built entirely of cost-effective, commercially available components that are suitable for integration into closed-loop deposition control; Evaluation of pulsed DC sputtering of Se; and Interaction with CIS National Team industrial partners to specify and adapt sensor functions

In-Situ Sensors for Process Control of CuIn(Ga)Se2 Module Deposition; Annual Technical Report, 15 February 1998-15 February 1999