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We report the design, assembly, operation and application of an aberrationcorrected photoemission microscope. The instrument used novel hyperbolic mirror-correctors with two and three electrodes that allowed simultaneous correction of spherical and chromatic aberrations. A spatial resolution of 5.4nm was obtained with this instrument in 2009, and 4.7nm in subsequent years. New imaging methodology was introduced involving interferometric imaging of light diffraction. This methodology was applied in nano-photonics and in the characterization of surface-plasmon polaritons. Photonic crystals and waveguides, optical antennas and new plasmonic devices such as routers, localizers and filters were designed and demonstrated using the new capabilities offered by the microscope. Manuscript date: 9/28/2017 Project titles and active periods (1) Electron Mapping on the Nanoscale (6/2007-6/2010) (2) High-Resolution Photoemission Electron Microscopy (6/2010-6/2013) (3) High-Resolution Photoemission Electron Microscopy on Femtosecond Time Scales (6/20136/2017)

Aberration correction in photoemission microscopy and applications in photonics and plasmonics