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The pulsed kicker magnets used for the injection of H into the SNS accumulator ring consist of ceramic chambers to avoid harmful inductance generated by the rapid magnetic field rise time. The inner surfaces of these ceramic chambers will be coated with a thin metallic layer (Ti or TiN) to meet the requirements of both the penetration of pulse magnetic field and small beam coupling impedance, also reduce the secondary electron yield. This paper describes the metallization facility for the 0.85m long ceramic chamber which has been developed at BNL. The facility produces thinknesses up to 10 microns titanium or titanium-nitride by means of DC magnetron sputtering.

Study of Metallization of Ceramic Vacuum Chambers in SNS Ring Injection System