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Carbon Alumina films were deposited on the surface of iron substrate at room temperature using impulse plasma deposition (IPD) method. The plasma beam was generated from a coaxial plasma gun. The pulsed plasma mainly consists of two kinds of ions: working gas ions and inner electrode ions. Acetylene gas (C2H2) was used as a source of carbon atoms. While the inner electrode was the source of the Aluminum present in the deposited Alumina phase. Coatings were produced on iron substrates by a number of plasma pulses (50 200) from 15.42 μF capacitor bank at 13.5 kV discharging voltage. The plasma coaxial gun parameters were determined. The microstructure of the deposited Carbon Alumina films were observed using scanning electron microscope (SEM) while the surface microhardness was measured using Vickers micro-hardness testing machine. The deposited film thickness was measured using electronic coating thickness tester. The surface microhardness increased by 65% at 200 plasma pulses from its value for untreated iron substrate. The film thickness increases with the number of plasma pulses with an average deposition rate of 30 nm/pulse.

STUDY OF THE MECHANICAL AND METALLOGRAPHIC PROPERTIES OF CARBON-ALUMINA COATED IRON PRODUCED BY IMPULSE PLASMA DEPOSITION