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High-purity germanium compounds (e.g. germanium dioxide) are used these days in several applications (e.g. germanium-based detectors, semiconductors, fiber-optic systems). Thus, reliable methods for the routine determination of trace element impurities from germanium compounds must be developed. In this study, inductively coupled plasma mass spectrometry, inductively coupled plasma optical emission spectrometry and/or electrothermal atomic-absorption spectrometry was used for the determination of fifteen impurity elements in germanium dioxide. Possible interference effects due to a germanium matrix were eliminated/minimized by a simple open-vessel volatilization of germanium tetra chloride before the determinations. The results, based on the data gathered over a period of one year, showed that the long-run performance of the method is good, and it can be used for routine analysis of impurity elements in high-purity germanium dioxide.

Determination of Trace Impurities in Germanium Dioxide by ICP-OES, ICP-MS and ETAAS after Matrix Volatilization: A Long-run Performance of the Method