Preparation of near-1-µm-thick {100}-oriented epitaxial Y-doped HfO2 ferroelectric films on (100)Si substrates by a radio-frequency magnetron sputtering method | Zendy

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Preparation of near-1-µm-thick {100}-oriented epitaxial Y-doped HfO<sub>2</sub> ferroelectric films on (100)Si substrates by a radio-frequency magnetron sputtering method

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