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The Mn content and crystallographic structure of Co–Mn thin films electrodeposited by rectangular pulse voltages over a megahertz frequency range were investigated using energy dispersive X-ray (EDX) microanalysis and X-ray diffraction (XRD). The EDX analyses demonstrated that in accordance with the phenomenological theory of multi-component electrodeposition (Int. J. Electrochem. Sci., 15 (2020) 6561), the Mn content increased with the cathode potentials, significantly changed at resonant frequencies when the cathode potential was equal to the Mn potential barrier, and approached a saturated value. The potential barriers of Co and Mn were determined to be 1.32 and 2.26 V, respectively. The Co–Mn films containing 40-56 wt% Mn were produced from a Co/Mn solution with a mole ratio of 1.2. The XRD analysis revealed that the Co–Mn thin films had amorphous structures.

Prediction of Mn Contents of Amorphous Co-Mn Thin Films Formed during Electrodeposition