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The elemental content of Co–Ni–Fe–Mn thin films electrodeposited by a rectangular pulse voltage were investigated using energy dispersive X-ray microscopy (EDX). The EDX analyses revealed that the behaviors of the mean elemental content Mi, where i denotes an element of the Co–Ni–Fe–Mn thin films, were divided into three groups by the potential barrier Vbi and cathode potential Vc: (a) for Vc > Vbi, the values of Mi were consistent with the activity Si of element-i in the solution, (b) for Vc = Vbi , the oscillation of the element-i content occurred at specific frequencies of the rectangular pulse voltage, and (c) for Vc < Vbi , Mi were determined by SiJi where Ji denotes the current in the Fowler–Nordheim equation that represents the emission of electrons from the Fermi level to the energy level of i–ions on the electric double layer. This study demonstrated that the elemental contents of multi-element electrodeposits can be predicted using Vbi and Vc.

international journal of electrochemical science

Prediction of the Elemental Content of Thin Films Electrodeposited from a Multi–component Solution: Co–Ni–Fe– Mn Thin Film as an Example of Multi–element Electrodeposits