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In the present research NdFeB thin films coupled with buffer and capping layer of W were formed on Si/SiO2 substrate by means of RF magnetron sputtering. The system was annealed at vaccum at different temperatures of 450, 500, 550,. * لوئسم پ تابتاکم یکینورتکلا تس : alikhanjani@yahoo.com D ow nl oa de d fr om ja m e. iu t.a c. ir at 1 :4 0 IR S T o n S at ur da y N ov em be r 2n d 20 19 [ D O I: 10 .1 88 69 /a ca dp ub .ja m e. 35 .1 .1 09 ]

The Role of Annealing Temperature on Structural and Magnetic Properties of NdFeB Thin Films