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Zirconium oxide (ZrO2) thin films were grown by thermal oxidation of metallic zirconium films deposited by sputtering of zirconium target by DC magnetron sputtering technique. The zirconium films were thermally oxidized in oxygen atmosphere at temperatures in the range 300-500C. The as-deposited and oxidized films were characterized for chemical composition by energy dispersive X-ray analysis, structure by X-ray diffraction, chemical binding configuration with Fourier transform infrared spectroscopy and optical absorption using UV-Vis NIR spectrophotometer. Metallic zirconium film was polycrystalline in nature with hexagonal structured Zr. The films oxidized at 300C were of mixed phase of Zr and ZrO2. The zirconium films were transformed into monoclinic structured ZrO2 with polycrystalline in nature at oxidation temperature of 400C. Crystallite size of the ZrO2 films increased from 19 nm to 27 nm with increase of oxidation temperature form 400C to 500C. The optical band gap increased from 5.42 eV to 5.46 eV and refractive index decreased from 2.05 to 2.02 with increase of oxidation temperature from 400C to 500C.

Structural and Optical Properties of Thermally Oxidized Zirconium Dioxide Films