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X-ray microscopy is due to the small wavelength and high penetration depth an auspicious technique for improved investigations of materials on nm-scale. For this, multilayer zone plates (MZP) with well-defined and smooth multilayers of low thickness grown on wires are promising optical elements. The combination of pulsed laser deposition (PLD) and focused ion beam (FIB) has been proven to be extraordinarily suitable for the fabrication of MZPs and a a sub-5nm hard x-ray (7.9 keV) focus could be demonstrated which represents the world's smallest x-ray focus so far. In order to make those MZPs applicable for nanoscopy basically a larger overall multilayer thickness is essential. For this, a deep understanding of the underlying processes (such as target changes as well as resputtering and backscattering during film growth) is essential. Hence, detailed investigations have been carried out using complementary methods such as X-ray diffraction (XRD), X-ray reflectivity (XRR), transmission electron microscopy (TEM) in cross section as well as SDTrimSP simulations. Eventually MZPs could be realized that allowed microscopic investigations with 50nm resolution, having the potential of resolutions down to 10nm.

Multilagenzonenplatten für die Mikroskopie mit harter Röntgenstrahlung