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We investigated the plasma conditions for obtaining highly efficient extreme ultraviolet light from laser- produced tin plasmas for lithography of next generation semiconductors. Based on accurate atomic data tables calculated using the detailed configuration accounting code, we conducted 1-D radiation hydrodynamic simulations to calculate the dynamics of tin plasma and its emission of extreme ultraviolet light. We included the photo-excitation effect in the radiation transport. Our simulation reproduced experimental observations successfully. Using our verified code, we found that a CO2 laser can be useful in obtaining higher conversion efficiencies up to 4%. c

Optimization of Extreme Ultraviolet Emission from Laser-Produced Tin Plasmas Based on Radiation Hydrodynamics Simulations