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In this work, two different processes to deposit Graphene-based transparent conductive films on arbitrary insulting substrates have been developed and examined. The first process is a PE-CVD, based on a gas mixture containing hydrocarbons (e.g. methane) inside a vacuum chamber where the insulating substrates are placed on a temperature controlled heating plate. The second process uses a pulsed filtered vacuum arc system (Phi-HCA) to homogeneously deposit a small, well defined amount of carbon on heated substrates. The substrates are tilted with respect to the particle beam and placed on a heating plate. A gas atmosphere consisting of Argon or Argon/Hydrogen decreases the particle energy and influences the morphology of the growing film. For both processes, Scanning Tunneling Microscopy (STM), Transmission Electron Microscopy (TEM) and Raman spectra have been used for a thorough characterization of the samples in order to optimize the growth parameters. Subsequently, the results (sheet resistance, Hall mobility, transmittance) have been compared with respect to the state of the art, reported in literature. The best carbon layers have a surface resistance of 5E3 Ohm_sqr while the optical transparency of the coatings is 88% with an excellent homogeneity over areas of several cm^2. Both for the PE-CVD and the Phi-HCA, the area of deposition is only limited by the respective area of the heated surface. The obtained results and the fact, that the process can be compatible with most semiconductor fabrication processes, makes them promising for various industrial applications.

Carbon-based functional Materials for Application in Photonics, Optoelectronics and Sensorics