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ZnO thin films have been deposited on silica glass substrate using the chemical bath deposition techni que. The precursors used were zinc chloride and aqueous ammonia. The solutio n was stirred continuously with the help of a magne tic stirrer at a bath temperature of 70 o C and a deposition time of 70 minutes. The elementa l composition and the surface morphology were studi ed using energy dispersive and scanning electron micro scopy. The band gap was 2.72, 2.66, 2.60 eV for as- deposited, annealed at 200 o C and 300 o C respectively. There was a red shift in the band g ap energy as the annealing temperature was increase d. This might be due to an improvement in the crystallinity of the ZnO thin films.

SYNTHESIS AND CHARACTERIZATION OF ZNO THIN FILMS DEPOSITED BY CHEMICAL BATH TECHNIQUE