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Helium implantation in surfaces is of interest for plasma facing materialsand other nuclear applications. Vanadium as both a representative bcc materialand a material relevant for fusion applications is implanted using a Helium ionbeam microscope, and the resulting swelling and nanomechanical properties arequantified. These values are put in correlation to data obtained from microresidual stress measurements using a focused ion beam based ring-coretechnique. We found that the swelling measured is similar to literature values.Further we are able to measure the surface stress caused by the implantationand find it approaches the yield strength of the material at blistering doses.The simple calculations performed in the present work, along with severalgeometrical considerations deduced from experimental results confirm thedriving force for blister formation comes from bulging resulting mainly fromgas pressure buildup, rather than solely stress induced buckling.

Quantifying residual stress in Helium implanted surfaces and its implication for blistering