English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Tools annual

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Tools monthly

Global: Zendy Plus monthly

Presents the access of premium content as premium feature

Premium Content

Global: Zendy Plus annual

Global: Zendy Free Plan

W-Si-N films were deposited by reactive sputtering in a Ar + N-2 atmosphere from a W target encrusted with different number of Si pieces and followed by a thermal annealing at increasing temperatures up to 900 degrees C. Three iron-based substrates with different thermal expansion coefficients, in the range of 1.5 x 10(-6) to 18 x 10(-6) K-1 were used. The chemical composition, structure, residual stress, hardness (H), and Young's modulus (E) were evaluated after all the annealing steps. The as-deposited film with low N and Si contents was crystalline whereas the one with higher contents was amorphous. After thermal annealing at 900 degrees C the amorphous film crystallized as body-centered cubic alpha-W. The crystalline as-deposited film presented the same phase even after annealing. There were no significant changes in the properties of both films up to 800 degrees C annealing. However, at 900 degrees C, a strong decrease and increase in the hardness were observed for the crystalline and amorphous films, respectively. It was possible to find a good correlation between the residual stress and the hardness of the films. In several cases, particularly for the amorphous coating, H/E higher than 0.1 was reached, which envisages good tribological behavior. The two methods (curvature and x-ray diffraction) used for calculation of the residual stress of the coatings showed fairly good agreement in the results.

Evolution of the microstructure, residual stresses, and mechanical properties of W–Si–N coatings after thermal annealing