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Mechanical properties of the film deposited by the sputtering method, such as the adhesion, hardness, friction coefficient, and internal stress, are one of important characters. In this study, to clarify the relationship between the mechanical properties and microstructure and to control the mechanical properties of the film deposited by the sputtering method, adhesion, hardness, friction and internal stress of permalloy films deposited by facing target sputtering were investigated. The adhesion of the film could be improved by an increase in sputtering gas pressure and introducing the ion bombardment to the film surface during sputtering. Hardness of the film was decreased as the sputtering gas pressure was decreased and ion bombardment to the film surface was enhanced, where the crystallinity of the film was improved. Film stress can be controlled by controlling the sputtering gas pressure and the amount of the ion bombardment. The relationship between the stress and the adhesion was not observed, and friction coefficient of the film was changed little with sputtering conditions.

Mechanical Properties of Permalloy Thin Films Deposited by Sputtering