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(Ge2)x(GaAs)1−x graded gap layers were grown using the method of liquid phase epitaxy on GaAs substrates. Investigated are distributions of chemical components along the thickness of the epitaxial layer. In accord to the scan patterns obtained in characteristic X-rays, the layers have a perfect structure, and the component distributions both along the thickness and the interface are rather monotonous, macroscopic defects and metal inclusions are absent. In the epitaxial layers, we created p-n junctions by diffusion of Zn from a gas phase. We studied the possibilities of using the GaAs(Ge2)x(GaAs)1−x structures as solar converters including the near infra-red region. In this case, the GaAs substrate serves as a filter for light quanta with the energy hν < EgGaAs. The conversion efficiency dependences on the gradient x and the p-n junction position inside the (Ge2)x(GaAs)1−x graded gap layer are also shown.

p-n junctions obtained in (Ge2)x(GaAs)1–x varizone solid solutions by liquid phase epitaxy