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The temporal evolution of photogenerated carriers in CuWO 4 , CuO and WO 3  thin films deposited via a direct chemical vapor deposition approach was studied using time-resolved microwave conductivity and terahertz spectroscopy to obtain the photocarrier lifetime, mobility and diffusion length. The carrier transport properties of the films prepared by varying the copper-to-tungsten stoichiometry were compared and the results related to the performance of the compositions built into respective photoelectrochemical cells. Superior carrier mobility was observed for CuWO 4  under frontside illumination.

Comparative Study of Photocarrier Dynamics in CVD-deposited CuWO 4 , CuO, and WO 3 Thin Films for Photoelectrocatalysis