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The doping effect on the reservoir carrier temperature of the electron and hole in quantum dot optical amplifiers (QD SOAs) has been formalized and modeling, taking into account the most of carrier heating (CH) contributions such as; free carrier absorption, carrier heating time relaxation, interdot relaxation time, occupation probability of dot level, injected current and electron-hole interaction. The theoretical simulation shows the carrier temperature increasing straight forward with increasing the surface density of the donor and accepter which had not studied earlier as the best of our knowledge. It clears that, the surface carrier concentration of donor or acceptor atoms supplying more hot carriers for wetting layer (WL) which is leading an increasing the carrier temperature. In other word, the long life time of carriers from WL to Quantum Dot (QD) states is very high. Consequently, the collision of carriers and nonradiative relaxation are increasing the CH effect. Also, the majority of carrier is responsible on the increasing of electron or hole temperature, so the variation electron temperature in N-type is higher than hole in valence band, while the reverse is done with doping with P-type.

The effect of doping on the electrons and holes in quantum dot semiconductor optical amplifiers