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In order to provide the basis to efficiently reduce the energy consumption and improve the removal rate, the simultaneous removal processes of SO 2  and NO in two pulsed discharge plasma systems (NO/SO 2 /N 2 /O 2 /H 2 O and NO/SO 2 /N 2 /O 2 ) were simulated respectively, and then the removal characteristics of these two gas systems were analyzed. The results show that NO can be completely removed when the residence time is close to 1.3 s and SO 2  removal rate is 61.5% when the residence time reaches 3 s in a system containing water vapor. When the system does not contain water vapor, NO removal rate is still much high, while S O2  removal rate is approximately zero, and its concentration is below 1 × 10 -6  at all levels of O 2  concentration. When the system contains water vapor and the residence time reaches 3 s, the concentrations of HNO 3 , HNO 2 , N 2 O and N 2 O 5  are 102 × 10 -6 , 15 × 10 -6 , 35 × 10 -6  and 19 × 10 -6 , respectively, while HSO 3  concentration is approximately zero throughout the entire process and the removed SO 2  is converted to H 2 SO 4  completely. HO 2  concentration is very small during the process. After NO is removed completely, H 2 O 2  concentration rises from zero to 16 × 10 -6  at the end of the process. When the system does not contain water vapor, trends of change in the concentrations of NO, NO 2 , N 2 O 5  and N 2 O are almost the same as those in a system containing water vapor. When O 2  concentration is increased, NO removal velocity will be faster and the peak of the concentration curve of NO 2  will be higher. NO removing velocity is much faster in a system containing water vapor than that in a system without water vapor when both systems have almost the same O 2  concentration.

Simulation of Simultaneous Removal of SO2 and NO Using Pulsed Discharge