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The characterization of radical oxidation was studied in phenolic compounds degradation by a H 2 O 2 / UV advanced oxidation process (AOP). The UV irradiation source was a low-pressure mercury vapour lamp that was axially centred in a tubular reaction system. The effects of hydrogen peroxide, phenol molar ratio and pH have been investigated. From bibliography regarding the generation of radicals in the H 2 O 2 /UV system, a kinetic model has been developed, making it possible to estimate the concentration of different radical species. These concentrations mark a determined oxidative level, the evolution of which will be analyzed under a series of initial conditions involving pH and the molar ratio of phenol to hydrogen peroxide.

Characterization of the Radical Oxidative Level in the Degradation of Phenolic Compounds with H 2 O 2 /UV