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In this study, polymer thin films were prepared and patterned by vapor deposition photo-polymerization of 6-diallylamino-[1,3,5]-triazine-2,4-dithiol) on SiO 2 /Si substrates. The characterizations of these films were investigated using FT-IR-RAS, XPS, optical microscopy and AFM. The polymerization rate of 0.10 ~ 0.14 min -1  was obtained by an ex-situ FT-IR-RAS study. The structure characterized with XPS showed that the polymer films contained disulfide bonds produced by thiol groups, and monosulfide bonds produced by the reaction between allyl and thiol groups and formed network chains. Furthermore, the 2.19 μm pattern of lines and spaces was developed sufficiently by optical observation

Fabrication and characterization of poly(triazine dithiol) thin films using a two-step deposition/ photopolymerization process and micropattern