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This paper describes a method for designing an ultraviolet (UV) projection lens for microlithography. Our approach for meeting this objective is to use a starting design automatically obtained by the DSEARCH feature in the SYNOPSYS™ lens design program. We describe the steps for getting a desired starting point for the projection lens and discuss optimization problems unique to this system, where the two parts of the projection lens are designed independently.

Design of an ultraviolet projection lens by using a global search algorithm and computer optimization