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The objective of the research work was to optimize and standardize sputtering parameters based on physical parameters and electrical properties of the coatings. The experimental and statistical investigation was conducted for optimizing thesputtering parameters. The sputtering parameters were selected as sputtering power, working gas pressure, substrate temperature and deposition time. For coating of MCrAlY thin film on a borofloat glass substrate, the electrolytic MCrAlY target wasused based on a design of experiment layout. The thin film coatings were characterized for film thickness and surface roughness. The optimum conditions for maximum thickness and minimum surface roughness are sputtering power (17.57 W), working gaspressure (5x10-3mbar), substrate temperature (100˚C) and deposition time (32 min). The ANOVA results for film thickness showed the contribution of deposition time (93.92) followed by working pressure (3.26 %), substrate temperature (2.052 %) andpower (0.646%)

Optimization of Electrical and Morphological Properties of MCrAlY thin films deposited by DC magnetron sputtering using Taguchi method