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We performed micromachining of relatively thick siloxane films by proton beam writing (PBW) with beam energy of 1 MeV. The polydimethylsiloxane (PDMS) prepolymer films with a thickness of about 13 m were spin-coated onto silicon substrates. After exposure to the 1-MeV proton beam (~1 m in diameter), the samples were developed. The PDMS shows the behavior of negative resist and can be regarded as analog resist where the thickness of the structure gradually increases as a function of the proton beam (PB) fluence. Using this feature of the PDMS, we manufactured micro lenses with diameter of 40 m by changing PB fluence. Micro-patterning of the PDMS films using scanning proton beam can offer a possibility of making three-dimensional structures for silica-based devices without baking and mask process. Key word: siloxane, proton beam writing, polydimethylsiloxane, micro lens

Fabrication of silica-based three-dimensional structures by changing fluence using proton beam writing