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Joshua B. Ratchford, Mikiko Saito, and Takayuki Homma Department of Nano-Science and Nano-Engineering, Waseda University, Shinjuku-ku Tokyo, Japan email address: j.ratchford@kurenai.waseda.jp Nanotechnology Research Center, Waseda University, Shinjuku-ku Tokyo, Japan email address: mikiko@ waseda.jp *Department of Applied Chemistry, Waseda University, Shinjuku, Tokyo, Japan email address: t.homma@waseda.jp

Microstructure Formation within Films of Silicon using Electrochemical Anodization