Influences of C7H8, Ar and H2 additions on the formation of BCN:O,H films using trimethylborate and N2 gases by bipolar-type plasma based ion implantation | Zendy

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Influences of C7H8, Ar and H2 additions on the formation of BCN:O,H films using trimethylborate and N2 gases by bipolar-type plasma based ion implantation

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