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Since microcolumn was developed in IBM, steady research and efforts have been devoted to improve its structure and performance. Basically a microcolumn is a tiny electron column having simple geometrical structure with the height of about 10 mm and nearly similar lateral size. Due to the small size of the column, the apertures for the electron beam path should be made very small without losing the high quality in its shape, which is compulsory requirement in order to reduce the optical abberations and to maintain the high performance. The lens electrodes with small (μm size) and high quality apertures can be fabricated by using the MEMS technologies [1-3]. However, the assembly of a microcolumn is still complicated, which is a bottleneck in the production of multiple electron beam system. The most promising advantage of a microcolumn is that the multiple electron beam system can be developed by using it as a basis and the multiple electron beam system can be practically applied for high resolution lithography or inspection by overcoming the drawback of low throughput [4-8]. In a microcolumn, a tungsten (W) field emitter has been usually adopted as an electron emitter. However, the assembly of a microcolumn adopting tungsten emitter is not so easy because of either the long-term stability or the difficulty in the alignment procedure of a tungsten tip and the small source lens aperture. Even though carbon nanotube (CNT) is also used for an electron emitter because of the low turn-on voltage and higher beam current, there still remains the same alignment Comparison of Electron Emission Characteristics of W and CNT Field Emitter for Microcolumn