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A method is demonstrated of making interference filters fabricated using a layer of metal oxide deposited by a new atmospheric pressure atomic layer deposition (ALD) technique. By depositing different thicknesses of metal oxides between reflecting layers, filters with various spectral characteristics can be made. A method of patterning the ALD layers has been devised using ink-jet and this allows the fabrication of a colour filter arrays of any design. [DOI: 10.1380/ejssnt.2009.284]

Fabrication of a Patterned Interference Filter Array Deposited by an Atmospheric Pressure Vapour Deposition Technique