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Background    Bacillus  spores are notoriously resistant to unfavorable conditions such as UV radiation, γ-radiation, H 2 O 2 , desiccation, chemical disinfection, or starvation.  Bacillus pumilus  SAFR-032 survives standard decontamination procedures of the Jet Propulsion Lab spacecraft assembly facility, and both spores and vegetative cells of this strain exhibit elevated resistance to UV radiation and H 2 O 2  compared to other  Bacillus  species.    Principal Findings  The genome of  B. pumilus  SAFR-032 was sequenced and annotated. Lists of genes relevant to DNA repair and the oxidative stress response were generated and compared to  B. subtilis  and  B. licheniformis . Differences in conservation of genes, gene order, and protein sequences are highlighted because they potentially explain the extreme resistance phenotype of  B. pumilus . The  B. pumilus  genome includes genes not found in  B. subtilis  or  B. licheniformis  and conserved genes with sequence divergence, but paradoxically lacks several genes that function in UV or H 2 O 2  resistance in other  Bacillus  species.    Significance  This study identifies several candidate genes for further research into UV and H 2 O 2  resistance. These findings will help explain the resistance of  B. pumilus  and are applicable to understanding sterilization survival strategies of microbes.

Paradoxical DNA Repair and Peroxide Resistance Gene Conservation in Bacillus pumilus SAFR-032